Lab Instrumentation and Methods

The laboratory instrumentation consists of three ultra-high vacuum (UHV) chambers equipped with various surface-sensitive methods. Each system also provides techniques for preparation of well defined samples from pure single crystals to multicomponent materials with complex surface morphology.

Additionally, we have a vacuum system for optical spectroscopy in infrared range (FTIR), ambient pressure microreactor for reactivity measurements, apparatus for measurement of gas sensing properties and magnetron sputter deposition system.

Project

STM-XPS-TPD-LEED UHV system

UHV system for model studies of surface structure and reactivity relationships

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Project

RHEED-XPS UHV system

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XPS-TPD-MB UHV system

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FTIR vacuum system with RAIRS setup

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Laboratory microreactor

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Gas sensor apparatus

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Project

Magnetron sputter-coating

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