Lab Instrumentation and Methods
The laboratory instrumentation consists of three ultra-high vacuum (UHV) chambers equipped with various surface-sensitive methods. Each system also provides techniques for preparation of well defined samples from pure single crystals to multicomponent materials with complex surface morphology.
Additionally, we have a vacuum system for optical spectroscopy in infrared range (FTIR), ambient pressure microreactor for reactivity measurements, apparatus for measurement of gas sensing properties and magnetron sputter deposition system.

STM-XPS-TPD-LEED UHV system
UHV system for model studies of surface structure and reactivity relationships
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RHEED-XPS UHV system
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XPS-TPD-MB UHV system
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FTIR vacuum system with RAIRS setup
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Laboratory microreactor
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Gas sensor apparatus
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Magnetron sputter-coating
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