Lab Instrumentation and Methods
The laboratory instrumentation consists of three ultra-high vacuum (UHV) chambers equipped with various surface-sensitive methods. Each system also provides techniques for preparation of well defined samples from pure single crystals to multicomponent materials with complex surface morphology.
Additionally, we have a vacuum system for optical spectroscopy in infrared range (FTIR), ambient pressure microreactor for reactivity measurements, apparatus for measurement of gas sensing properties and magnetron sputter deposition system.
STM-XPS-TPD-LEED UHV system
UHV system for model studies of surface structure and reactivity relationships
Learn more
RHEED-XPS UHV system
UHV system for surface structure and chemical analysis of model systems using photoemission and electron diffraction.
Learn more
XPS-TPD-MB UHV system
UHV system for model studies of surface composition, adsorption, and reactivity relationships
Learn more
FTIR system with vacuum RAIRS and high-presure DRIFTS
Operando system for IR vibrational spectroscopy in a wide range of pressures and temperatures
Learn more
Laboratory microreactor with gas analysis
Small volume planar reactor with QMS for reactivity measurements at ambient pressures
Learn more
