About the system
System for preparation of metallic, oxide and other thin films by magnetron sputtering. DC and RF operation together with controlled inert or reactive gas atmospheres make it possible to prepare model layers for catalysis, sensing and materials studies.
Experimental methods
- Magnetron sputtering: physical vapour deposition from metallic or compound targets using DC or RF excitation
- Reactive sputtering: oxide and compound-film growth in controlled mixtures such as Ar/O2
Further equipment & capabilities
- DC and radiofrequency power sources
- Manual and automatic RF matching
- Manual and computer-controlled gas inlet system
Typical research topics
- Cobalt-oxide and related catalyst films
- Metal-doped tungsten-oxide gas-sensing layers
- Functional oxide and multicomponent thin films