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UT=001719121800001 OR UT=001629234700001 OR UT=001205630400001 OR UT=001049978900002 OR UT=000833768500001 OR UT=000816617100001 OR UT=000848163400007
BibTeX entries:
@ARTICLE{Turek:26:Investigation,
author = {Turek, Z. AND Mašek, T. AND Mishra, H. AND Nihed Mekki, R. AND Čada, M. AND Hubička, Z. AND Tichý, M. AND Kudrna, P.},
title = {Investigation of plasma–material interactions on different substrates using a hot tungsten cathode system for liquid metal divertor applications},
journal = {Plasma Phys. Control. Fusion},
fulljournal = {PLASMA PHYSICS AND CONTROLLED FUSION},
volume = {68},
number = {3},
pages = {035020},
eid = {035020},
year = {2026},
issn = {0741-3335},
doi = {10.1088/1361-6587/ae4b67},
KFPPid = {2782},
}
@ARTICLE{Pratiush:25:Mic-hackathon,
author = {Pratiush, U. AND Houston, A. AND Barakati, K. AND Raghavan, A. AND Bulanadi, R. AND Yin, X. AND Welborn, S.S. AND Yoon, D. AND K P, H. AND Baraissov, Z. AND Ma, D. AND Jakowski, M. AND Barhorst, S.-.P. AND Pattison, A.J. AND Manganaris, P. AND Madugula, S.S. AND Gayathri Ayyagari, S.V. AND Kennedy, V. AND Wang, M. AND Pang, K.J. AND Addison-Smith, I. AND Menacho, W. AND Guzman, H.V. AND Kiefer, A. AND Furth, N. AND Kolev, N.L. AND Petrov, M. AND Liu, V. AND Ilyev, S. AND Rairao, S. AND Rodani, T. AND Pinto-Huguet, I. AND Chen, X. AND Cruañes, J. AND Torrens, M. AND Pomar, J. AND Su, F. AND Vedanti, P. AND Lyu, Z. AND Wang, X. AND Yao, L. AND Taqieddin, A. AND Laskowski, F. AND Shao, Y.-.T. AND Fein-Ashley, B. AND Jiang, Y. AND Kumar, V. AND Mishra, H. AND Paul, Y. AND Bazgir, A. AND Praneeth Madugula, R.C. AND Zhang, Y. AND Omprakash, P. AND Huang, J. AND Montufar-Morales, E. AND Chawla, V. AND Sethi, H. AND Huang, J. AND Kurki, L. AND Guinan, G. AND Salvador, A. AND Ter-Petrosyan, A. AND Van Winkle, M. AND Spurgeon, S.R. AND Narasimha, G. AND Wu, Z. AND Liu, R. AND Liu, Y. AND Slautin, B. AND Lupini, A.R. AND Vasudevan, R. AND Duscher, G. AND Kalinin, S.V.},
title = {Mic-hackathon 2024: hackathon on machine learning for electron and scanning probe microscopy},
journal = {Mach. Learn.: Sci. Technol.},
fulljournal = {Machine Learning: Science and Technology},
volume = {6},
number = {4},
pages = {040701},
eid = {040701},
year = {2025},
issn = {2632-2153},
doi = {10.1088/2632-2153/ae1f5d},
KFPPid = {2755},
}
@ARTICLE{Mishra:24:Electron,
author = {Mishra, H. AND Tuharin, K. AND Turek, Z. AND Tichý, M. AND Kudrna, P.},
title = {Electron density measurements in low-pressure plasmas using cutoff probes and comparison with hairpin and Langmuir probes},
journal = {Phys. Plasmas},
fulljournal = {Physics of Plasmas},
volume = {31},
number = {4},
pages = {043510},
eid = {043510},
year = {2024},
issn = {1070-664X},
doi = {10.1063/5.0192799},
KFPPid = {2527},
}
@ARTICLE{Mishra:23:Investigation,
author = {Mishra, H. AND Mašek, T. AND Turek, Z. AND Čada, M. AND Hubička, Z. AND Kudrna, P. AND Tichý, M.},
title = {Investigation of Tin Removal for Liquid Metal Tokamak Divertor by Low Pressure Argon Arc with Hot Tungsten Cathode System},
journal = {J Fusion Energ},
fulljournal = {Journal of Fusion Energy},
volume = {42},
number = {2},
pages = {36},
eid = {36},
year = {2023},
issn = {1572-9591},
doi = {10.1007/s10894-023-00374-8},
KFPPid = {2435},
}
@ARTICLE{Mishra:22:Optical,
author = {Mishra, H. AND Tichý, M. AND Kudrna, P.},
title = {Optical emission spectroscopy study of plasma parameters in low-pressure hollow cathode plasma jet and planar magnetron powered by DC and pulsed DC supply},
journal = {Vacuum},
fulljournal = {Vacuum},
volume = {205},
number = {},
pages = {111413},
eid = {111413},
year = {2022},
issn = {0042-207X},
doi = {10.1016/j.vacuum.2022.111413},
KFPPid = {2334},
}
@ARTICLE{Mishra:22:Application,
author = {Mishra, H. AND Bolouki, N. AND Hsieh, S.T. AND Li, C. AND Wu, W. AND Hsieh, J.-.H.},
title = {Application of Spectroscopic Analysis for Plasma Polymerization Deposition onto the Inner Surfaces of Silicone Tubes},
journal = {Coatings},
fulljournal = {Coatings},
volume = {12},
number = {6},
pages = {865},
eid = {865},
year = {2022},
issn = {2079-6412},
doi = {10.3390/coatings12060865},
KFPPid = {2335},
}
@ARTICLE{Hsieh:22:The,
author = {Hsieh, S.T. AND Mishra, H. AND Bolouki, N. AND Wu, W. AND Li, C. AND Hsieh, J.-.H.},
title = {The Correlation of Plasma Characteristics to the Deposition Rate of Plasma Polymerized Methyl Methacrylate Thin Films in an Inductively Coupled Plasma System},
journal = {Coatings},
fulljournal = {Coatings},
volume = {12},
number = {7},
pages = {1014},
eid = {1014},
year = {2022},
issn = {2079-6412},
doi = {10.3390/coatings12071014},
KFPPid = {2333},
}
Bibitems:
\bibitem[{Turek et~al.(2026)}]{Turek:26:Investigation}
Turek, Z., Mašek, T., Mishra, H., Nihed Mekki, R., Čada, M., Hubička, Z., Tichý, M., Kudrna, P., Investigation of plasma–material interactions on different substrates using a hot tungsten cathode system for liquid metal divertor applications. {\it Plasma Phys. Control. Fusion.} {\bf 68}(3): 035020, 2026.
\bibitem[{Pratiush et~al.(2025)}]{Pratiush:25:Mic-hackathon}
Pratiush, U., Houston, A., Barakati, K., Raghavan, A., Bulanadi, R., Yin, X., Welborn, S.S., Yoon, D., K P, H., Baraissov, Z., Ma, D., Jakowski, M., Barhorst, S.-.P., Pattison, A.J., Manganaris, P., Madugula, S.S., Gayathri Ayyagari, S.V., Kennedy, V., Wang, M., Pang, K.J., Addison-Smith, I., Menacho, W., Guzman, H.V., Kiefer, A., Furth, N., Kolev, N.L., Petrov, M., Liu, V., Ilyev, S., Rairao, S., Rodani, T., Pinto-Huguet, I., Chen, X., Cruañes, J., Torrens, M., Pomar, J., Su, F., Vedanti, P., Lyu, Z., Wang, X., Yao, L., Taqieddin, A., Laskowski, F., Shao, Y.-.T., Fein-Ashley, B., Jiang, Y., Kumar, V., Mishra, H., Paul, Y., Bazgir, A., Praneeth Madugula, R.C., Zhang, Y., Omprakash, P., Huang, J., Montufar-Morales, E., Chawla, V., Sethi, H., Huang, J., Kurki, L., Guinan, G., Salvador, A., Ter-Petrosyan, A., Van Winkle, M., Spurgeon, S.R., Narasimha, G., Wu, Z., Liu, R., Liu, Y., Slautin, B., Lupini, A.R., Vasudevan, R., Duscher, G., Kalinin, S.V., Mic-hackathon 2024: hackathon on machine learning for electron and scanning probe microscopy. {\it Mach. Learn.: Sci. Technol.} {\bf 6}(4): 040701, 2025.
\bibitem[{Mishra et~al.(2024)}]{Mishra:24:Electron}
Mishra, H., Tuharin, K., Turek, Z., Tichý, M., Kudrna, P., Electron density measurements in low-pressure plasmas using cutoff probes and comparison with hairpin and Langmuir probes. {\it Phys. Plasmas.} {\bf 31}(4): 043510, 2024.
\bibitem[{Mishra et~al.(2023)}]{Mishra:23:Investigation}
Mishra, H., Mašek, T., Turek, Z., Čada, M., Hubička, Z., Kudrna, P., Tichý, M., Investigation of Tin Removal for Liquid Metal Tokamak Divertor by Low Pressure Argon Arc with Hot Tungsten Cathode System. {\it J Fusion Energ.} {\bf 42}(2): 36, 2023.
\bibitem[{Mishra et~al.(2022)}]{Mishra:22:Optical}
Mishra, H., Tichý, M., Kudrna, P., Optical emission spectroscopy study of plasma parameters in low-pressure hollow cathode plasma jet and planar magnetron powered by DC and pulsed DC supply. {\it Vacuum.} {\bf 205}: 111413, 2022.
\bibitem[{Mishra et~al.(2022)}]{Mishra:22:Application}
Mishra, H., Bolouki, N., Hsieh, S.T., Li, C., Wu, W., Hsieh, J.-.H., Application of Spectroscopic Analysis for Plasma Polymerization Deposition onto the Inner Surfaces of Silicone Tubes. {\it Coatings.} {\bf 12}(6): 865, 2022.
\bibitem[{Hsieh et~al.(2022)}]{Hsieh:22:The}
Hsieh, S.T., Mishra, H., Bolouki, N., Wu, W., Li, C., Hsieh, J.-.H., The Correlation of Plasma Characteristics to the Deposition Rate of Plasma Polymerized Methyl Methacrylate Thin Films in an Inductively Coupled Plasma System. {\it Coatings.} {\bf 12}(7): 1014, 2022.