WOS advanced search query (RED – proceedings): PŘÍMÝ LINK
UT=001191988800001 OR UT=000900746200002 OR UT=001025992800001 OR UT=001038727700001 OR UT=000954163900001 OR UT=000524211800051 OR UT=000473389900022 OR UT=000473389900023
BibTeX entries:
@ARTICLE{Kapran:24:Crystalline,
author = {Kapran, A. AND Hippler, R. AND Wulff, H. AND Olejnicek, J. AND Volfova, L. AND Pisarikova, A. AND Nepomniashchaia, N. AND Cada, M. AND Hubicka, Z.},
title = {Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture},
journal = {Coatings},
fulljournal = {Coatings},
volume = {14},
number = {3},
pages = {319},
eid = {319},
year = {2024},
issn = {2079-6412},
doi = {10.3390/coatings14030319},
KFPPid = {2510},
}
@ARTICLE{Kapran:23:Characteristics,
author = {Kapran, A. AND Hippler, R. AND Wulff, H. AND Olejnicek, J. AND Pisarikova, A. AND Cada, M. AND Hubicka, Z.},
title = {Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films},
journal = {Vacuum},
fulljournal = {Vacuum},
volume = {215},
number = {Sep},
pages = {112272},
eid = {112272},
year = {2023},
issn = {0042-207X},
doi = {10.1016/j.vacuum.2023.112272},
KFPPid = {2452},
}
@ARTICLE{Kapran:23:Investigation,
author = {Kapran, A. AND Antunes, V.G. AND Hubička, Z. AND Ballage, C. AND Minea, T.},
title = {Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths},
journal = {J. Vac. Sci. Technol. A },
fulljournal = {Journal of Vacuum Science & Technology A},
volume = {41},
number = {1},
pages = {013003},
eid = {013003},
year = {2023},
issn = {0734-2101,1520-8559},
doi = {10.1116/6.0002309},
KFPPid = {2454},
}
@ARTICLE{Jirátová:23:Nickel-Copper,
author = {Jirátová, K. AND Soukal, P. AND Kapran, A. AND Babii, T. AND Balabánová, J. AND Koštejn, M. AND Čada, M. AND Maixner, J. AND Topka, P. AND Hubička, Z. AND Kovanda, F.},
title = {Nickel-Copper Oxide Catalysts Deposited on Stainless Steel Meshes by Plasma Jet Sputtering: Comparison with Granular Analogues and Synergistic Effect in VOC Oxidation},
journal = {Catalysts},
fulljournal = {Catalysts},
volume = {13},
number = {3},
pages = {595},
eid = {595},
year = {2023},
issn = {2073-4344},
doi = {10.3390/catal13030595},
KFPPid = {2453},
}
@ARTICLE{Antunes:23:Influence,
author = {Antunes, V.G. AND Rudolph, M. AND Kapran, A. AND Hajihoseini, H. AND Raadu, M.A. AND Brenning, N. AND Gudmundsson, J.T. AND Lundin, D. AND Minea, T.},
title = {Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges},
journal = {Plasma Sources Sci. Technol.},
fulljournal = {Plasma Sources Science and Technology},
volume = {32},
number = {7},
pages = {075016},
eid = {075016},
year = {2023},
issn = {0963-0252},
doi = {10.1088/1361-6595/ace847},
KFPPid = {2451},
}
@ARTICLE{Hubička:20:Plasma,
author = {Hubička, Z. AND Čada, M. AND Kapran, A. AND Olejníček, J. AND Kšírová, P. AND Zanáška, M. AND Adámek, P. AND Tichý, M.},
title = {Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture},
journal = {Coatings},
fulljournal = {Coatings},
volume = {10},
number = {3},
pages = {246},
eid = {246},
year = {2020},
issn = {2079-6412},
doi = {10.3390/coatings10030246},
KFPPid = {2066},
}
Bibitems:
\bibitem[{Kapran et~al.(2024)}]{Kapran:24:Crystalline}
Kapran, A., Hippler, R., Wulff, H., Olejnicek, J., Volfova, L., Pisarikova, A., Nepomniashchaia, N., Cada, M., Hubicka, Z., Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture. {\it Coatings.} {\bf 14}(3): 319, 2024.
\bibitem[{Kapran et~al.(2023)}]{Kapran:23:Characteristics}
Kapran, A., Hippler, R., Wulff, H., Olejnicek, J., Pisarikova, A., Cada, M., Hubicka, Z., Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films. {\it Vacuum.} {\bf 215}(Sep): 112272, 2023.
\bibitem[{Kapran et~al.(2023)}]{Kapran:23:Investigation}
Kapran, A., Antunes, V.G., Hubička, Z., Ballage, C., Minea, T., Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths. {\it J. Vac. Sci. Technol. A .} {\bf 41}(1): 013003, 2023.
\bibitem[{Jirátová et~al.(2023)}]{Jirátová:23:Nickel-Copper}
Jirátová, K., Soukal, P., Kapran, A., Babii, T., Balabánová, J., Koštejn, M., Čada, M., Maixner, J., Topka, P., Hubička, Z., Kovanda, F., Nickel-Copper Oxide Catalysts Deposited on Stainless Steel Meshes by Plasma Jet Sputtering: Comparison with Granular Analogues and Synergistic Effect in VOC Oxidation. {\it Catalysts.} {\bf 13}(3): 595, 2023.
\bibitem[{Antunes et~al.(2023)}]{Antunes:23:Influence}
Antunes, V.G., Rudolph, M., Kapran, A., Hajihoseini, H., Raadu, M.A., Brenning, N., Gudmundsson, J.T., Lundin, D., Minea, T., Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges. {\it Plasma Sources Sci. Technol.} {\bf 32}(7): 075016, 2023.
\bibitem[{Hubička et~al.(2020)}]{Hubička:20:Plasma}
Hubička, Z., Čada, M., Kapran, A., Olejníček, J., Kšírová, P., Zanáška, M., Adámek, P., Tichý, M., Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture. {\it Coatings.} {\bf 10}(3): 246, 2020.