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UT=000467510900047 OR UT=000414084900001 OR UT=000362529800008 OR UT=000339620200069 OR UT=000302839400003 OR UT=000454714800008 OR UT=000391299600066 OR UT=000344464700017


BibTeX entries:
@ARTICLE{Novák:19:Study,
	 author = {Novák, S. AND Hrach, R. AND Palacký, J. AND Hrachová, V. AND Ibehej, T.},
	 title = {Study of dynamic processes in multi-component low-temperature plasmas},
	 journal = {Vacuum},
	 fulljournal = {Vacuum},
	 volume = {164},
	 number = {Jun},
	 pages = {308--311},
	 year = {2019},
	 issn = {0042-207X},
	 doi = {10.1016/j.vacuum.2019.03.031},
	 KFPPid = {1970},
}

@ARTICLE{Ibehej:17:Computer,
	 author = {Ibehej, T. AND Hromádka, J. AND Hrach, R.},
	 title = {Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition},
	 journal = {Adv. Mater. Sci. Eng.},
	 fulljournal = {Advances in Materials Science and Engineering},
	 volume = {2017},
	 number = {Oct 18},
	 pages = {4283547},
	 eid = {4283547},
	 year = {2017},
	 issn = {1687-8434},
	 doi = {10.1155/2017/4283547},
	 KFPPid = {1760},
}

@ARTICLE{Hromadka:15:Computer,
	 author = {Hromadka, J. AND Ibehej, T. AND Hrach, R.},
	 title = {Computer modelling of electronegative plasma sheaths and their mutual interaction},
	 journal = {Phys. Scr.},
	 fulljournal = {PHYSICA SCRIPTA},
	 volume = {90},
	 number = {10},
	 pages = {105603},
	 eid = {105603},
	 year = {2015},
	 issn = {0031-8949},
	 doi = {10.1088/0031-8949/90/10/105603},
	 KFPPid = {1538},
}

@ARTICLE{Hromadka:14:Computational,
	 author = {Hromadka, J. AND Ibehej, T. AND Hrach, R.},
	 title = {Computational study of plasma sheath interaction},
	 journal = {Phys. Scr.},
	 fulljournal = {PHYSICA SCRIPTA},
	 volume = {2014},
	 number = {T161},
	 pages = {014068},
	 eid = {014068},
	 year = {2014},
	 issn = {0031-8949},
	 doi = {10.1088/0031-8949/2014/T161/014068},
	 KFPPid = {1401},
}

@ARTICLE{Ibehej:12:Computational,
	 author = {Ibehej, T. AND Hrach, R.},
	 title = {Computational study of sheath structure for plasma-assisted technologies in the presence of electronegative plasma},
	 journal = {Vacuum},
	 fulljournal = {VACUUM},
	 volume = {86},
	 number = {9},
	 pages = {1220--1222},
	 year = {2012},
	 issn = {0042-207X},
	 doi = {10.1016/j.vacuum.2011.04.005},
	 KFPPid = {1233},
}


Bibitems:

\bibitem[{Novák et~al.(2019)}]{Novák:19:Study}
Novák, S., Hrach, R., Palacký, J., Hrachová, V., Ibehej, T., Study of dynamic processes in multi-component low-temperature plasmas. {\it Vacuum.} {\bf 164}(Jun): 308--311, 2019.

\bibitem[{Ibehej et~al.(2017)}]{Ibehej:17:Computer}
Ibehej, T., Hromádka, J., Hrach, R., Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition. {\it Adv. Mater. Sci. Eng.} {\bf 2017}(Oct 18): 4283547, 2017.

\bibitem[{Hromadka et~al.(2015)}]{Hromadka:15:Computer}
Hromadka, J., Ibehej, T., Hrach, R., Computer modelling of electronegative plasma sheaths and their mutual interaction. {\it Phys. Scr.} {\bf 90}(10): 105603, 2015.

\bibitem[{Hromadka et~al.(2014)}]{Hromadka:14:Computational}
Hromadka, J., Ibehej, T., Hrach, R., Computational study of plasma sheath interaction. {\it Phys. Scr.} {\bf 2014}(T161): 014068, 2014.

\bibitem[{Ibehej and Hrach(2012)}]{Ibehej:12:Computational}
Ibehej, T., Hrach, R., Computational study of sheath structure for plasma-assisted technologies in the presence of electronegative plasma. {\it Vacuum.} {\bf 86}(9): 1220--1222, 2012.