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BibTeX entries:

@ARTICLE{Zhang:23:Photoelectrochemical,
	 author = {Zhang, X. AND Lyu, Y. AND Zhou, H. AND Zheng, J. AND Huang, A. AND Ding, J. AND Xie, C. AND De Marco, R. AND Tsud, N. AND Kalinovych, V. AND Jiang, S.P. AND Dai, L. AND Wang, S.},
	 title = {Photoelectrochemical N₂‐to‐NH₃ Fixation with High Efficiency and Rates via Optimized Si‐Based System at Positive Potential versus Li^0/+},
	 journal = {Adv. Mater.},
	 fulljournal = {Advanced Materials},
	 volume = {35},
	 number = {21},
	 pages = {2211894},
	 eid = {2211894},
	 year = {2023},
	 issn = {0935-9648,1521-4095},
	 doi = {10.1002/adma.202211894},
	 KFPPid = {2421},
}

Bibitems:

\bibitem[{Zhang et~al.(2023)}]{Zhang:23:Photoelectrochemical}
Zhang, X., Lyu, Y., Zhou, H., Zheng, J., Huang, A., Ding, J., Xie, C., De Marco, R., Tsud, N., Kalinovych, V., Jiang, S.P., Dai, L., Wang, S., Photoelectrochemical N₂‐to‐NH₃ Fixation with High Efficiency and Rates via Optimized Si‐Based System at Positive Potential versus Li^0/+. {\it Adv. Mater.} {\bf 35}(21): 2211894, 2023.