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BibTeX entries:

@ARTICLE{Kot:19:Al2O3‐Atomic,
	 author = {Kot, M. AND Henkel, K. AND Müller, K. AND Kegelmann, L. AND Albrecht, S. AND Tsud, N. AND Kúš, P. AND Matolínová, I. AND Schmeißer, D.},
	 title = {Al2O3‐Atomic Layer Deposited Films on CH3NH3PbI3: Intrinsic Defects and Passivation Mechanisms},
	 journal = {Energy Technol.},
	 fulljournal = {Energy Technology},
	 volume = {7},
	 number = {11},
	 pages = {1900975},
	 eid = {1900975},
	 year = {2019},
	 issn = {2194-4288},
	 doi = {10.1002/ente.201900975},
	 KFPPid = {2019},
}

Bibitems:

\bibitem[{Kot et~al.(2019)}]{Kot:19:Al2O3‐Atomic}
Kot, M., Henkel, K., Müller, K., Kegelmann, L., Albrecht, S., Tsud, N., Kúš, P., Matolínová, I., Schmeißer, D., Al2O3‐Atomic Layer Deposited Films on CH3NH3PbI3: Intrinsic Defects and Passivation Mechanisms. {\it Energy Technol.} {\bf 7}(11): 1900975, 2019.